Computation
Pattern
Pattern
LAYERED
PATTERNS
Introducing layers and symmetric difference operation to pattern making
Iterating has always
been a habit. Even before learning Processing, I used procedural ways akin to
Karl Gerstner’s programmatic methods to create iterations of logos, symbols, patterns, and much more.
During one such iteration session, a unique step emerged — introducing
layers and the symmetric difference operation to the pattern-making
process.
METHOD
These patterns are generated by the
following logic:
-
Choose a primary motif.
-
The first layer will have the
shape in a 1 x 1 grid unit.
-
With each ascending layer, the
grid units will double. For instance, on the second layer, the shape is replicated
four times in a 2 x 2 grid unit.
-
After creating all the layers, the
shapes are blended using the symmetric difference operation.
This operation exists in Illustrator as ‘Exclude’ function, resulting in a compound shape while excluding overlapping motif areas.
OUTPUT ITERATIONS
A LITTLE MORE
By adding two more steps to the process,
patterns can further be stylized:
- Create a gradient stroke
version of the pattern.
- Use the effects in Filter Gallery in Illustrator to stylize the pattern.